Image forming method
AssigneeFUJIFILM Corporation
InventorTakahiro Goto
Life of this patent
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Abstract
The present invention provides an image forming method comprising the steps of exposing imagewisely an image forming material having a photosensitive layer comprising an infrared absorbing agent, a polymerization initiator and a polymerizable compound on a substrate to overlapping infrared beams. The solubility of the photosensitive layer in an alkali developing solution reduces upon exposure to light of wavelengths in the range of 750 nm to 1400 nm. The exposed image forming material is developed, and the infrared beam diameter used in light exposure is 20 μm or less, and the overlapping coefficient is 0.8 or more.
Claims16
An image forming method comprising:
- scanning exposing an image forming material having a photosensitive layer comprising an infrared absorbing agent, a polymerization initiator and a polymerizable compound on a substrate to infrared beams from a light source so that the distance between centers of the infrared beams in the sub-scanning direction is smaller than the beam diameter of each of the infrared beams, the solubility of the photosensitive layer in an alkali developing solution being reduced upon exposure to light of wavelengths in the range of 750 nm to 1400 nm;
- and
- forming an image by developing the exposed image forming material,
- wherein the imagewise light exposure is carried out under conditions where the infrared beam diameter is 20 μm or less, and the overlapping coefficient, which is the ratio of the full-width half-maximum (FWHM) of the infrared beam diameter to the distance between beam centers in the sub-scanning direction, is in the range of 0.8 to 4.
An image forming method comprising:
- exposing imagewisely an image forming material having a photosensitive layer comprising an infrared absorbing agent, a polymerization initiator and a polymerizable compound on a substrate to infrared beams emitted from a laser diode light source so that the distance between centers of the infrared beams in the sub-scanning direction is smaller than the beam diameter of each of the infrared beams, the solubility of the photosensitive layer in an alkali developing solution being reduced upon exposure to light of wavelengths in the range of 750 nm to 1400 nm;
- and
- developing the image forming material,
- wherein the imagewise light exposure is carried out under conditions where the resolution of the infrared beam used in the light exposure step is 300 to 1300 dpi, the beam diameter is 20 μm or less, and the overlapping coefficient, which is the ratio of the full-width half-maximum (FWHM) of the infrared beam diameter to the distance between beam centers in the sub-scanning direction, is in the range of 0.8 to 4.
Dependencies are inferred from the claim text.