Positive resist composition, method of forming resist pattern, polymeric compound, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsDaiju Shiono, Takahiro Dazai, Hiroaki Shimizu
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Abstract
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.
Claims8
A positive resist composition comprising a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
- said base component (A) comprising a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below:
- wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent;
- B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent;
- and R2 represents an acid dissociable, dissolution inhibiting group.
A polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:
- wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent;
- B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent;
- and R2 represents an acid dissociable, dissolution inhibiting group.
Dependencies are inferred from the claim text.