Cleaning of native oxide with hydrogen-containing radicals

A substrate cleaning apparatus comprising:

• (a) a remote source to remotely energize a hydrogen-containing gas to form a remotely energized gas comprising a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species;
• and
• (b) a process chamber comprising:
• (i) a substrate support;
• (ii) an ion filter capable of filtering the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio;
• the ion filter comprising a wire grid mounted on or at least partially embedded in a dielectric gas distributor such that the surfaces of the wire grid and the gas distributor are in physical contact and the openings in the wire grid coincide with apertures in the dielectric gas distributor to introduce the filtered energized gas into the chamber.