Substrate processing apparatus

A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:

• a processing section for applying processing to a substrate;
• an interface that is provided adjacent to an end of said processing section for exchanging the substrate between said processing section and said exposure device;
• and
• an indexer that is provided adjacent to another end of said processing section, carries in the substrate to said processing section and carries out the substrate from said processing section, wherein said processing section includes:
• a first processing unit that cleans an edge of the substrate before the exposure processing by said exposure device;
• a second processing unit that applies predetermined processing to the substrate before the exposure processing by said exposure device,
• a third processing unit that applies predetermined processing to the substrate after the exposure processing by said exposure device,
• a first processing block arranged adjacent to said indexer and including said first processing unit and a first transport unit that transports the substrate;
• one or plurality of second processing blocks that each include said second processing unit and a second transport unit that transports the substrate;
• and
• one or plurality of third processing blocks that each include said third processing unit and a third transport unit that transports the substrate, wherein said first processing unit cleans the edge of the substrate before the processing by said second processing unit and wherein said third processing unit includes a drying processing unit that applies drying processing to the substrate after the exposure processing by said exposure device,
• said third processing block including said drying processing unit is arranged adjacent to said interface,
• said interface includes a fourth transport unit that transfers the substrate before the exposure processing to said exposure device, transports the substrate after the exposure processing from said exposure device to said drying processing unit and receives the substrate after the drying processing by said drying processing unit.

A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:

• a processing section for applying processing to a substrate;
• and
• an interface that is provided adjacent to an end of said processing section for exchanging the substrate between said processing section and said exposure device, wherein said processing section includes:
• a first processing unit that cleans an edge of the substrate before the exposure processing by said exposure device;
• a second processing unit that includes a photosensitive film formation unit that forms a photosensitive film made of a photosensitive material on the substrate and a protective film formation unit that forms a protective film for protecting said photosensitive film and applies predetermined processing to the substrate before the exposure processing by said exposure device;
• and
• a third processing unit that applies predetermined processing to the substrate after the exposure processing by said exposure device, and wherein said first processing unit cleans the edge of the substrate before the processing by said second processing unit.