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US 7,601,984 B2Granted
Field effect transistor with amorphous oxide active layer containing microcrystals and gate electrode opposed to active layer through gate insulator
AssigneesCanon Kabushiki Kaisha, Tokyo Institute of Technology
InventorsMasafumi Sano, Katsumi Nakagawa, Hideo Hosono, Toshio Kamiya, Kenji Nomura
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Abstract
A novel amorphous oxide applicable, for example, to an active layer of a TFT is provided. The amorphous oxide comprises microcrystals.
Claims6
A field effect transistor comprising an active layer of an amorphous oxide containing a microcrystal, wherein a grain boundary interface of the microcrystal is surrounded by the amorphous oxide and a gate electrode formed so as to face the active layer through a gate insulator.
Dependencies are inferred from the claim text.