Determining positional error of an optical component using structured light patterns
AssigneeDimensional Photonics International, Inc.
InventorsRobert F. Dillon, Roy D. Allen, Neil Judell, Yi Qian
Life of this patent
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AssigneeDimensional Photonics International, Inc.
InventorsRobert F. Dillon, Roy D. Allen, Neil Judell, Yi Qian
Estimating the term…
Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager, and a processor. The imager is rigidly coupled to the projector to maintain a stable relationship to the projected, structured light pattern. The imager receives the structured light pattern and together with the processor, determines whether the projected image includes a positional error. In some embodiments, the projector is a multi-channel projector, each channel having an optical axis spatially separated from the others, one of the channels including the imager and dedicated for determining positional error. In other embodiments, the projector is a single-channel projector projecting a structured light pattern onto the object, a portion of the structured light pattern being tapped-off for determining positional error.
A multiple channel interferometer projector for projecting fringes onto a surface of an object, comprising:
A multiple channel interferometer projector for projecting fringes onto a surface of an object, comprising:
A method for determining a positional error of a diffraction grating, comprising:
An interferometer projector for projecting fringes onto a surface of an object, comprising:
Dependencies are inferred from the claim text.