Pattern inspection apparatus
AssigneeHitachi High-Technologies Corporation
InventorsMasayoshi Takeda, Hirokazu Ito
Life of this patent
Estimating the term…
Abstract
The defect confirmation screen of a pattern inspection apparatus that allows the user to create a recipe and check defects easily and quickly includes a “map display part” where a wafer map is displayed, an “image display part” where a list of defect images is displayed, a “list display part” where detailed information on defects is displayed and set, and a “graph display part” where a graph is displayed for selected defect items. Those display parts cooperate with each other and change the defect images, defect information list, and defect graph according to selected map information. A classification code, a clustering condition, and a display filter entered using the information described above are registered in a recipe.
Claims17
A pattern inspection apparatus comprising:
- substrate holding means for holding a substrate on which a pattern is formed;
- application means for applying a laser beam, a beam, or a charged particle beam to the substrate held by said substrate holding means;
- detection means for detecting a signal generated from the substrate by the application;
- storage means for imaging and storing the signal detected by said detection means;
- comparison means for comparing the image stored in said storage means with an another image formed from a pattern identical in design;
- determination means for determining if defects are detected in the pattern based on the comparison result of said comparison means;
- display means having a map display part where positions of defects on the substrate are displayed as a map, an image display part where defect images are displayed, a list display part where a list of defect information is displayed, and a graph display part where statistical information on selected defect items is displayed as a graph;
- and
- area selection means for selecting an area included in the map displayed in said map display part,
- wherein, when a map area is selected by said area selection means, a list of defect images of defects in the selected map area is displayed in said image display part and a list of defect information on defects in the selected map area is displayed in said list display part.
A pattern inspection apparatus comprising:
- substrate holding means for holding a substrate on which a pattern is formed;
- application means for applying a laser beam, a beam, or a charged particle beam to the substrate held by said substrate holding means;
- detection means for detecting a signal generated from the substrate by the application;
- storage means for imaging and storing the signal detected by said detection means;
- comparison means for comparing the image stored in said storage means with an another image formed from a pattern identical in design;
- determination means for determining if defects are detected in the pattern based on the comparison result of said comparison means;
- display means having a map display part where positions of defects on the substrate are displayed as a map, an image display part where defect images are displayed, a list display part where a list of defect information is displayed, and a graph display part where statistical information on selected defect items is displayed as a graph;
- and
- area selection means for selecting an area included in the map displayed in said map display part,
- wherein a selected map area is displayed in said graph display part.
Dependencies are inferred from the claim text.