Calibration of a substrate inspection tool
AssigneeKLA-Tencor Technologies Corporation
InventorsSteven M. Labovitz, Weston L. Sousa
Life of this patent
Estimating the term…
Abstract
A method for calibration of a substrate inspection tool is disclosed. The tool is used to inspect a standard substrate having simulated contamination defects with known characteristics. Performance of the tool in detecting the simulated contamination defects is determined. The tool exposes the standard substrate and simulated contamination defects to radiation having a wavelength of about 260 nanometers or less. The simulated contamination defects are stable over time under exposure to radiation having a wavelength of about 260 nanometers or less.
Claims39
A method for calibration of a substrate inspection tool, comprising:
- using the tool to inspect a standard substrate having simulated contamination defects with known characteristics, wherein the tool exposes the standard substrate and simulated contamination defects to radiation having a wavelength of about 260 nanometers or less;
- determining the simulated contamination defects with the tool by comparing a detected pattern of radiation reflected by the standard substrate to a predicted pattern or by comparing the detected pattern of radiation transmitted through the standard substrate and a predicted pattern;
- and
- calibrating the tool against the determined simulated contamination defects;
- wherein the simulated contamination defects are stable over time under exposure to radiation having a wavelength of about 260 nanometers or less.
A method for using of a substrate inspection tool, comprising:
- using the tool to inspect a standard substrate having simulated contamination defects with known characteristics, wherein the tool exposes the standard substrate and simulated contamination defects to radiation having a wavelength of about 260 nanometers or less;
- determining a performance of the tool in detecting the simulated contamination defects;
- wherein the simulated contamination defects are stable over time under exposure to radiation having a wavelength of about 260 nanometers or less;
- using the tool to measure an amplitude of scattering of the radiation by one or more localized scattering defects on a test substrate;
- comparing the amplitude of scattering of the radiation by one or more localized scattering defects to an amplitude of scattering of the radiation of the simulated contaminant defects of the standard substrate;
- and
- calibrating the tool against the amplitude of scattering of the radiation of the simulated contaminant defects.
Dependencies are inferred from the claim text.