Optical emission spectroscopy process monitoring and material characterization
AssigneeWaferMasters, Inc.
InventorsWoo Sik Yoo, Kitaek Kang
Life of this patent
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Abstract
Methods and systems for control and monitoring processing of semiconductor materials with a focused laser beam. Laser light may be focused on a sample to excite optical emission at the sample surface during processing, which may include laser processing. Optical emission spectra produced may be analyzed for various properties effectively during the process. For example, process effects such as chemical composition analysis, species concentration, depth profiling, homogeneity characterization and mapping, purity, and reactivity may be monitored by optical spectral analysis. The wavelength may be selected to be appropriate for the process effect chosen.
Claims32
A method of material processing comprising:
- providing a laser beam of a selected wavelength and a selected peak power;
- focusing the laser beam to a desired depth of a material;
- controlling to a selected value the total energy in the laser;
- scanning the laser beam in a programmed pattern over a surface of the material;
- and
- collecting optical emission spectra from the material to determine material characteristics at the desired depth.
A sample process monitoring and control system, comprising:
- a laser system;
- a sample scanning system adapted to direct a focused beam from the laser to a desired depth of a sample;
- an optical spectrometer adapted to characterize the processing of the sample based on optical emission spectra;
- optical elements adapted to couple the optical emission spectra obtained from the sample to the optical spectrometer;
- a controller adapted to control operations of the sample scanning system and the optical spectrometer;
- and
- a processor adapted to interface with the controller, the sample scanning system, and the optical spectrometer, wherein the processor provides instructions to the controller and generates a processing script for operations of a processing system based at least on the obtained optical emission spectra.
Dependencies are inferred from the claim text.