Semiconductor device comprising transistor pair isolated by trench isolation
AssigneeFujitsu Microelectronics Limited
InventorsAtsushi Okamoto, Toshiharu Takaramoto
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AssigneeFujitsu Microelectronics Limited
InventorsAtsushi Okamoto, Toshiharu Takaramoto
Estimating the term…
A semiconductor device has transistors (P1,P10,P11) formed in an active region (22) isolated by a trench isolation region, and a predetermined circuit including a first and second transistors (P10,P11) that require symmetry or relativity characteristics, wherein the distances (S1) between a gate electrode and one end of the active region on a source side viewed from the gate electrode in the first and second transistor are substantially same, and the distances (D1) between a gate electrode and one end of the active region on a drain side viewed from the gate electrode in the first and second transistor are substantially same. The predetermined circuit includes, for example, a current mirror circuit that has a transistor pair of which gate is commonly connected, and a differential circuit that has a transistor pair whose sources are commonly connected, where an input signal is supplied to the gate, and an output signal is generated in the drain.
A semiconductor device comprising:
Dependencies are inferred from the claim text.