Laser produced plasma EUV light source
AssigneeCymer, Inc.
InventorsAlexander I. Ershov, William N. Partlo, Norbert Bowering, Bjorn Hansson
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Abstract
An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
Claims50
An EUV light source comprising;
- a laser source;
- a plasma chamber;
- and
- a beam delivery system having at least one auxiliary chamber, said auxiliary chamber having an input window for passing a laser beam from the laser source into the auxiliary chamber and an exit window for passing the laser beam into said plasma chamber.
A light source producing EUV by plasma formation of a material, said light source generating debris by plasma formation, said light source comprising:
- a plasma chamber;
- a CO2 laser source producing a laser beam having a wavelength, λ;
- a laser input window for said plasma chamber,
- a source for introducing an etchant for the plasma formation material into the plasma chamber,
- a subsystem heating deposited plasma formation material on the window to an elevated temperature, t, to increase a rate of a chemical reaction between deposited plasma formation material and the etchant;
- and
- wherein said window is substantially transparent to said wavelength, λ, and said window has a surface, said surface being chemically stable when exposed to said etchant at said temperature, t.
Dependencies are inferred from the claim text.