Lithographic apparatus and cleaning method therefor
AssigneeASML Netherlands B.V.
InventorsMaarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Johannes Hubertus Josephina Moors
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Abstract
A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.
Claims20
An EUV lithographic apparatus comprising:
- a radiation source configured to generate EUV radiation;
- a hydrogen radical source configured to supply hydrogen radicals to an application surface;
- and
- a guide configured to direct the hydrogen radicals to the application surface, said guide being provided with a coating having a hydrogen radical recombination constant of less than 0.2.
Dependencies are inferred from the claim text.