US 7,598,495 B2 · Methods and systems for trapping ion beam particles and focusing an ion beam

Abstract

A focusing particle trap system for ion implantation comprising an ion beam source that generates an ion beam, a beam line assembly that receives the ion beam from the ion beam source comprising a mass analyzer that selectively passes selected ions, a focusing electrostatic particle trap that receives the ion beam and removes particles from the ion beam comprising an entrance electrode comprising an entrance aperture and biased to a first base voltage, wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat, wherein the second surface of the entrance electrode is facing toward the center electrode and is concave, wherein the center electrode is positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage, wherein the center voltage is less than the first base voltage, wherein the first surface of the center electrode is facing toward the entrance electrode and is convex, wherein the second surface of the center electrode is facing away from the entrance electrode and is approximately flat, an exit electrode positioned a distance downstream from the center electrode comprising an exit aperture and biased to a second base voltage, and wherein the first surface of the exit electrode is facing toward the center electrode and is approximately flat, wherein the second surface of the exit electrode is facing away from the center electrode and is approximately flat, wherein a first electrostatic field is generated from the entrance electrode toward the center electrode and a second electrostatic field is generated from the exit electrode toward the center electrode; wherein the second base voltage is greater than the center voltage, and an end station that is downstream from the beam line assembly and receives the ion beam.

Claims33

Dependent claims

An ion implantation system comprising:

an ion beam source that generates an ion beam;
a beam line assembly that receives the ion beam from the ion beam source comprising:
a mass analyzer that selectively passes selected ions;
a focusing electrostatic particle trap that receives the ion beam and removes particles from the ion beam comprising:
an entrance electrode comprising an entrance aperture and biased to a first base voltage;
wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat;
wherein the second surface of the entrance electrode is facing toward the center electrode and is concave;
wherein the center electrode is positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage, wherein the center voltage is less than the first base voltage;
wherein the first surface of the center electrode is facing toward the entrance electrode and is convex;
wherein the second surface of the center electrode is facing away from the entrance electrode and is approximately flat;
an exit electrode positioned a distance downstream from the center electrode comprising an exit aperture and biased to a second base voltage;
and
wherein the first surface of the exit electrode is facing toward the center electrode and is approximately flat;
wherein the second surface of the exit electrode is facing away from the center electrode and is approximately flat;
wherein a first electrostatic field is generated from the entrance electrode toward the center electrode and a second electrostatic field is generated from the exit electrode toward the center electrode;
wherein the second base voltage is greater than the center voltage;
and
an end station that is downstream from the beam line assembly and receives the ion beam.

15 more elements

A focusing particle trap system for ion implantation comprising:

an entrance electrode comprising an entrance aperture and biased to a first base voltage;
a center electrode positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage;
an exit electrode positioned a distance downstream from the center electrode comprising an exit aperture and biased to a second base voltage, wherein the first base voltage and the second base voltage are greater than the center voltage;
and
wherein a first electrostatic field is generated from the entrance electrode toward the center electrode and a second electrostatic field is generated from the exit electrode toward the center electrode,
wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat;
wherein the second surface of the entrance electrode is facing toward the center electrode and is concave;
wherein the first surface of the center electrode is facing toward the entrance electrode and is convex;
wherein the second surface of the center electrode is facing away from the entrance electrode and is approximately flat;
wherein the first surface of the exit electrode is facing toward the center electrode and is approximately flat;
and
wherein the second surface of the exit electrode is facing away from the center electrode and is approximately flat;
and
the electrode surfaces provide vertical focusing.

11 more elements

A method of focusing an ion beam and trapping particles within the ion beam comprising:

providing an ion beam having particles and ions within the ion beam;
focusing horizontally the ion beam within a first horizontal focus region;
defocusing horizontally the ions within the ion beam within a horizontal defocus region;
trapping the particles within the horizontal defocus region by defocusing horizontally the particles of the ion beam to remove the particles from the ion beam;
and
focusing horizontally mainly the ions of the ion beam within a second horizontal focus region.

3 more elements

Dependencies are inferred from the claim text.

Methods and systems for trapping ion beam particles and focusing an ion beam

Life of this patent

Methods and systems for trapping ion beam particles and focusing an ion beam

Life of this patent

Abstract

Claims33