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US 7,598,492 B1Granted
Charged particle microscopy using super resolution
AssigneeKLA-Tencor Technologies Corporation
InventorsKenneth J. Krzeczowski, Mehran Nasser-Ghodsi, Mathew H. Lent
Life of this patent
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Abstract
A method for improving throughput in review of images from a charged particle beam microscopy tool and a charged particle beam microscopy tool are disclosed.
Claims25
A method for improving throughput in review of images from a charged particle beam microscopy tool, comprising:
- obtaining a plurality of low resolution images of a surface of a substrate with a charged particle beam microscopy tool;
- producing a super resolution image of the surface by extracting the super resolution image from aliasing present in the plurality of low resolution images due to vibration of the substrate, wherein the super resolution image comprises a plurality of pixels obtained from the two or more low resolution images.
A charged particle beam microscopy tool, comprising:
- a source of a charged particle beam;
- charged particle optics adapted to focus the charged particle beam onto a substrate;
- a detector adapted to detect secondary charged particles produced by interaction between the charged particle beam and the substrate;
- an image generator coupled to the detector, the image generator being adapted to produce one or more low resolution images based on the detection of the secondary charged particles by the detector;
- and
- an image analyzer, wherein the image analyzer is adapted to
- obtain a plurality of low resolution images from the image generator;
- and
- produce a super resolution image of the surface by extracting the super resolution image from aliasing present in the plurality of low resolution images due to vibration of the substrate, wherein the super resolution image comprises a plurality of pixels from the two or more low resolution images.
6 more elements
Dependencies are inferred from the claim text.