Vapor-deposition material for the production of layers of high refractive index
AssigneeMerck Patent GmbH
InventorsMartin Friz, Uwe Anthes, Reiner Dombrowski
Life of this patent
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Abstract
The present invention relates to vapor-deposition materials comprising Ta2Ox, where x=4.81 to 4.88, to processes for the preparation of the vapor-deposition materials, and to the use thereof for the production of layers of high refractive index.
Claims15
A vapor-deposition material comprising solid Ta2Ox, wherein x=4.81 to 4.88.
A process for the preparation of a vapor-deposition material comprising Ta2Ox, wherein x=4.81-4.88, said process comprising mixing Ta2O5 with from 1.9 to 3.1% by weight of Ta, based on the mixture, compressing or suspending the mixture, shaping and subsequently sintering under reduced pressure, until a material with x=4.81-4.88 is formed and discontinuing sintering.
A process for the preparation of a vapor-deposition materials of the formula Ta2O4.82 comprising mixing Ta2O5 with 3% by weight of Ta, based on the mixture, the mixture, comprising or suspending, shaping and subsequently sintering under reduced pressure, until a material with x=4.82 is formed and discontinuing sintering.
Dependencies are inferred from the claim text.