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US 7,598,125 B2Granted
Method for wafer level packaging and fabricating cap structures
AssigneeTouch Micro-System Technology Inc.
InventorsShih-Feng Shao, Ming-Yen Chiu
Life of this patent
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Abstract
A cap wafer with cavities is etched through areas not covered by a patterned photoresist to form a plurality of openings. The cap wafer is bonded to a transparent wafer at the surface having the cavities and is segmented around the cavities to form a plurality of cap structures. The cap structures are hermetically sealed to a device wafer to form hermetic windows over devices and pads located on the device wafer.
Claims13
A method for wafer level packaging comprising steps of:
- providing a cap wafer;
- forming a plurality of cavities on a surface of the cap wafer;
- forming a patterned photoresist on the cap wafer and etching the cap wafer through the patterned photoresist to form a plurality of openings, then removing the patterned photoresist;
- bonding the cap wafer to a transparent wafer at the surface having the cavities, wherein the cavities are not bonded to the transparent wafer;
- segmenting the cap wafer around the cavities and removing a portion of the cap wafer not bonded to the transparent wafer to form a plurality of cap structures;
- providing a device wafer with a plurality of devices and a plurality of contact pads electrically connected to the devices;
- and
- hermetically bonding the cap structures to the device wafer at positions corresponding to the devices to form a plurality of hermetic windows.
5 more elements
Dependencies are inferred from the claim text.