Method of fabricating a magnetic shift register
AssigneeInternational Business Machines Corporation
InventorsTze-chiang Chen, Stuart S. P. Parkin
Life of this patent
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Abstract
A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. A trench is etched in the multi-layer stack structure. A selective etching process is used to corrugate the walls of trench. A seed layer is applied to the walls and bottom of the trench; the seed layer is covered with a magnetic layer. The trench is filled with an insulating material. A patterned layer is applied and portions of insulating material exposed by the pattern are removed, forming holes. Magnetic material and seed layer exposed in holes is selectively removed. The holes are filled with insulating material and connecting leads are attached to data tracks.
Claims8
A method of forming a magnetic shift register for storing data, comprising:
- forming a plurality of contiguous trenches in a dielectric structure;
- forming indentations in inner walls of the trenches;
- selectively depositing alternating layers of insulating material and magnetic material within the trenches;
- forming indentations in the layers of magnetic material;
- and
- wherein the layers of magnetic material form a plurality of separately formed tracks that include data regions for storing data;
- fabricating one of the separately formed tracks by;
- etching a trench on the insulator;
- capping the trench with a first capping layer;
- forming a second capping layer on top of the multi-layer stack structure;
- non-selectively etching vias through the multi-layer stack structure;
- and
- selectively etching walls of the vias, forming notches and protuberances in the walls of the vias.
A method of forming a magnetic shift register for storing data, comprising:
- forming a first mating surface configuration in inner walls of a first trench of a dielectric structure;
- applying alternating layers of magnetic material and insulating material within the first trench;
- forming a second mating surface configuration in at least one of the magnetic material and insulating material;
- interfacing the first and second mating surfaces;
- and
- wherein the layers of magnetic material form a plurality of separately
- formed tracks that include data regions for storing data;
- fabricating one of the separately formed tracks by;
- etching a second trench;
- filling the second trench with a dielectric, or conductive material;
- applying a first capping layer to the surface of the insulating material
- forming a second capping layer on top of the multi-layer stack structure;
- and
- non-selectively etching vias through the multi-layer stack structure.
Dependencies are inferred from the claim text.