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US 7,598,017 B2Granted
Negative resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJun Iwashita, Kazuhito Sasaki, Sho Abe
Life of this patent
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Abstract
A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]
Claims11
A negative resist composition comprising:
- a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group,
- an alkali-soluble resin component (A) excluding said fluorine-containing resin component (F),
- an acid generator component (B) that generates acid upon exposure, and
- a cross-linking component (C),
- [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1].
2 more elements
Dependencies are inferred from the claim text.