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US 7,598,016 B2Granted
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTomohiro Kobayashi, Jun Hatakeyama, Yuji Harada
Life of this patent
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Abstract
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
Claims13
A resist composition comprising
- a polymer which changes its alkali solubility under the action of an acid as a base resin, and
- a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive.
Dependencies are inferred from the claim text.