Substrate for pattern formation

A pattern formed body comprising:

• a substrate for pattern formation and a wettability changeable layer, wherein the substrate for pattern formation comprises:
• a base material,
• a wettability inhibition part formed in a functional part formation region on the base material, and
• a wettability inhibition examining part formed in a contact angle measuring region provided in a functional part non formation region on the base material,
• wherein the wettability changeable layer is formed on the wettability inhibition part and the wettability inhibition examining part of the substrate for pattern formation so as to have a wettability change by an action of a photocatalyst accompanied by an energy irradiation,
• wherein the pattern formed body further comprises a wettability changeable pattern comprising a lyophilic region and a liquid repellent region formed by directing the energy to the wettability changeable layer,
• wherein same constituent materials are used for the wettability inhibition part and the wettability inhibition examining part,
• wherein the functional part formation region comprises a region with the wettability inhibition part formed and a region with no wettability inhibition part formed, and the wettability changeable layer in the functional part formation region further comprises a lyophilic region and a liquid repellant region, and
• wherein the contact angle measuring region comprises a region with the wettability inhibition examining part formed and a region with no wettability inhibition examining part formed and the wettability changeable layer in the contact angle measuring region comprises only a lyophilic region.