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AssigneeApplied Materials, Inc.
InventorsLing Chen, Vincent W. Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin, Dien-Yeh Wu, Alan Ouye, Mei Chang
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Embodiments of the invention provide chemical precursor ampoules that may be used during vapor deposition processes. In one embodiment, an apparatus for generating a chemical precursor gas used in a vapor deposition processing system is provided which includes a canister having a sidewall, a top, and a bottom forming an interior volume and a solid precursor material at least partially contained within a lower region of the interior volume. The apparatus further contains an inlet port and an outlet port in fluid communication with the interior volume and an inlet tube connected to the inlet port and positioned to direct a carrier gas towards the sidewall and away form the outlet port. In one example, the solid precursor contains pentakis(dimethylamido) tantalum (PDMAT). In another example, the apparatus contains a plurality of baffles that form an extended mean flow path between the inlet port and the outlet port.
An apparatus for generating a chemical precursor gas used in a vapor deposition processing system, comprising:
An apparatus for generating a chemical precursor gas used in a vapor deposition processing system, comprising:
An apparatus for generating a chemical precursor gas used in a vapor deposition processing system, comprising:
Dependencies are inferred from the claim text.