Pad conditioning device with flexible media mount
AssigneeApplied Materials, Inc.
InventorsShou-Sung Chang, Steven M. Zuniga
Life of this patent
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Abstract
A method and apparatus for conditioning is provided. In one embodiment, a conditioning disk includes a plurality of conditioning elements each having an abrasive working surface, and a flexible foundation having the conditioning elements coupled thereto. The flexible foundation has physical properties that retain the working surfaces in a substantially coplanar orientation with respect to the pad surface.
Claims8
A conditioning disk for conditioning a polishing pad, comprising:
- a plurality of conditioning elements each having an abrasive working surface;
- a flexible foundation having the conditioning elements coupled thereto, the flexible foundation having physical properties that retain the working surfaces in a substantially coplanar orientation with the polishing pad;
- and
- an in-plane stress-bearing layer coupled to the flexible foundation and the conditioning elements.
A conditioning mechanism for conditioning a polishing pad, comprising:
- a housing having a cavity;
- a flexible foundation coupled to the housing and having a first side bounding a portion of the cavity;
- a plurality of conditioning elements coupled to a second side of the flexible foundation, each conditioning element having an abrasive working surface, the flexible foundation having physical properties that retain the working surfaces in a substantially coplanar orientation independent of operational forces applied to the first side of the flexible foundation;
- and
- an in-plane stress-bearing layer coupled to the flexible foundation and the conditioning elements.
A conditioning disk for conditioning a polishing pad, comprising:
- a plurality of conditioning elements each having an abrasive working surface;
- a flexible foundation having the conditioning elements coupled thereto, the flexible foundation having physical properties that retain the working surfaces in a substantially coplanar orientation with the polishing pad;
- an in-plane stress-bearing layer coupled to the flexible foundation and the conditioning elements;
- and
- a reference ring circumscribing the flexible foundation.
A conditioning disk for conditioning a polishing pad, comprising:
- a plurality of conditioning elements each having an abrasive working surface;
- a flexible foundation having the conditioning elements coupled thereto, the flexible foundation having physical properties that retain the working surfaces in a substantially coplanar orientation with the polishing pad;
- an in-plane stress-bearing layer coupled to the flexible foundation and the conditioning elements;
- and
- at least one bladder in communication with the flexible foundation.
A conditioning disk for conditioning a polishing pad, comprising:
- a plurality of conditioning elements each having an abrasive working surface;
- a flexible foundation having the conditioning elements coupled thereto, the flexible foundation having physical properties that retain the working surfaces in a substantially coplanar orientation with the polishing pad;
- and
- an in-plane stress-bearing layer coupled to the flexible foundation and the conditioning elements, wherein the flexible foundation further comprises:
- a plurality of pressure application regions.
Dependencies are inferred from the claim text.