Integrated thin film explosive micro-detonator
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorGerald Laib
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Abstract
A method of making a thin film explosive detonator includes forming a substrate layer; depositing a metal layer in situ on the substrate layer; and reacting the metal layer to form a primary explosive layer. The method and apparatus formed thereby integrates fabrication of a micro-detonator in a monolithic MEMS structure using “in-situ” production of the explosive material within the apparatus, in sizes with linear dimensions below about 1 mm. The method is applicable to high-volume low-cost manufacturing of MEMS safety-and-arming devices. The apparatus can be initiated either electrically or mechanically at either a single point or multiple points, using energies of less than about 1 mJ.
Claims9
A method of making a thin film explosive detonator, comprising:
- forming a substrate layer;
- depositing a metal layer of comprising a metal explosive cation in situ on the substrate layer;
- and
- reacting the metal layer comprising said metal explosive cation with a HN3 gas reactant for forming a primary explosive layer,
- wherein said primary explosive layer is a detonator layer comprised of an azide-based explosive salt with a predetermined thickness.
Dependencies are inferred from the claim text.