Method of making a circuitized substrate
AssigneeInternational Business Machines Corporation
InventorsFrank D. Egitto, Kevin T. Knadle, Andrew M. Seman
Life of this patent
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Abstract
A method of making the circuitized substrate. The circuitized substrate includes a substrate having a substantially planar upper surface and a conductive layer positioned on the substantially planar upper surface. The conductive layer includes at least one side wall therein, defining an opening in the conductive layer. The conductive layer includes an end portion spaced from the opening, the end portion forming an acute angle with the substantially planar upper surface of the substrate. The at least one side wall is substantially perpendicular to the substantially planar upper surface of the substrate.
Claims12
A method of making a circuitized substrate, comprising the steps of:
- providing a substrate having an upper surface;
- forming a conductive layer having a substantially planar upper surface on and in direct mechanical contact with the upper surface of the substrate by laminating, plating, or sputtering a metal on the upper surface of the substrate;
- removing a first portion of the conductive layer to form an interim side wall in the conductive layer, said interim sidewall bounding a cavity in the conductive layer, said cavity comprising a curved surface having a concave shape;
- forming a layer of patternable material on the substantially planar upper surface of the conductive layer and on the interim side wall in the conductive layer, resulting in the cavity being completely filled with a first portion of the layer of patternable material and a side wall being formed in the layer of patternable material;
- removing portions of the interim side wall in the conductive layer and a portion of the substantially planar upper surface of the conductive layer to form a second side wall and a bottom wall, said bottom wall defined by the upper surface of the substrate, said second side wall being substantially perpendicular to the bottom wall;
- and
- after said removing portions of the interim side wall, removing a remaining portion of the layer of patternable material.
Dependencies are inferred from the claim text.