Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout

A method for using a database to quickly perform proximity correction on a layout, the method comprising:

• using at least one computer to:
• associating via the database a first sample in proximity to a first location in a first layout with a first proximity-correction, and wherein the first sample represents a portion of the first layout which is expected to cause manufacturing problems with a first feature;
• determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout's geometry within an ambit of the second location, wherein the second sample's geometry is expected to affect the shape of a second feature;
• and
• using the database to quickly perform proximity correction on the second sample by:
• querying the database using the second sample to determine whether the second sample's geometry is substantially similar to the first sample's geometry;
• and
• in response to determining that the second sample's geometry is substantially similar to the first sample's geometry, applying the first proximity correction to the second sample.

A computer-readable storage device storing instructions that when executed by a computer cause the computer to perform a method for using a database to quickly identify a manufacturing problem area in a layout, the method comprising:

• determining a first sample in proximity to a first location in a first layout, wherein the first sample represents the first layout's geometry within an ambit of the first location, wherein the first sample's geometry is expected to affect the shape of a first feature;
• performing a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems;
• storing the first simulation-result in a database;
• determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout's geometry within an ambit of the second location, and wherein the second sample's geometry is expected to affect the shape of a second feature;
• querying the database to determine if the second sample's geometry is substantially similar to the first sample's geometry;
• and
• in response to determining that that second sample's geometry is substantially similar to the first sample's geometry, using the first simulation-result to generate an indicator which indicates whether the second feature is expected to have manufacturing problems.

A computer-readable storage device storing instructions that when executed by a computer cause the computer to perform a method for using a database to quickly perform proximity correction on a layout, the method comprising:

• associating via the database a first sample in proximity to a first location in a first layout with a first proximity-correction, and wherein the first sample represents a portion of the first layout which is expected to cause manufacturing problems with a first feature;
• determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout's geometry within an ambit of the second location, wherein the second sample's geometry is expected to affect the shape of a second feature;
• and
• using the database to quickly perform proximity correction on the second sample by:
• querying the database using the second sample to determine whether the second sample's geometry is substantially similar to the first sample's geometry;
• and
• in response to determining that the second sample's geometry is substantially similar to the first sample's geometry, applying the first proximity correction to the second sample.