Vertical cavity surface emitting semiconductor laser device
AssigneeOpnext Japan, Inc.
InventorsKouji Nakahara, Koichiro Adachi, Takashi Shiota, Tomonobu Tsuchiya, Kazunori Shinoda
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AssigneeOpnext Japan, Inc.
InventorsKouji Nakahara, Koichiro Adachi, Takashi Shiota, Tomonobu Tsuchiya, Kazunori Shinoda
Estimating the term…
The relationship between the reflectivity characteristic of a DBR layer(s), in which an InP layer and an InGaAlAs layer are laminated alternatively, and the optical absorption characteristic of the InGaAlAs layer, is a trade-off in a vertical cavity surface emitting laser on an InP substrate. The present invention applies a semiconductor DBR layer(s), in which an InP layer and an InGaAlAs-MQW (multi-quantum-wells) layer are laminated alternatively, in order to dissolve the above trade-off. The InGaAlAs-MQW layer is composed of InGaAlAs-wells and barriers. The InP layer is doped uniformly and the InGaAlAs-MQW layer has a structure in which at least a part thereof is doped.
The vertical cavity surface emitting semiconductor laser device for emitting light vertically to an InP substrate comprising an active layer that generates light onto the InP substrate and a cavity-structure in which the upper and lower sides of the active layer are sandwiched by first and second reflectors in order to obtain a lasing light from light generated from the active layer,
The vertical cavity surface emitting semiconductor laser device for emitting light vertically to an InP substrate comprising an active layer that generates light onto the InP substrate and a cavity-structure in which the upper and lower sides of the active layer are sandwiched by first and second reflectors in order to obtain a lasing light from light generated from the active layer,
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