Multi mirror system for an illumination system
AssigneeCarl Zeiss SMT GmbH
InventorsMartin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Johannes Wangler, Jörg Schultz
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AssigneeCarl Zeiss SMT GmbH
InventorsMartin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Johannes Wangler, Jörg Schultz
Estimating the term…
There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.
An optical system, comprising:
Dependencies are inferred from the claim text.