Optoelectronic process and a device for inspection of an area of revolution of a receptacle

An optoelectronic process for the inspection of an area of revolution (T) of a receptacle (3) presenting an axis of revolution (X), where the process includes the following steps:

• illumination of the surface to be inspected (T) using a lighting system (5) presenting a lighting surface (S) with an axis of revolution (A) located in the extension of the axis of revolution (X) of the receptacle, and that includes at least three given radiation spectra separated from each other,
• formation of an image (I) of the surface to be inspected using a camera (7), for each angular sector (T1, T2, T3) of the surface to be inspected by selecting only the light rays returned by the surface to be inspected and presenting one of the said given radiation spectra, so as to eliminate the parasitic light rays whose radiation spectrum does not correspond to that selected for the said angular sector,
• and analysis of the image formed with check the characteristics of the surface to be inspected,
• characterized in that it consists of:
• illuminating the surface to be inspected (T) using the lighting system (5) whose the lighting surface (s) of revolution is divided over at least three angular sectors (S1, S2, S3), each emitting a given radiation spectrum, so that at each point of the angular sectors (S1, S2, S3) the radiation spectrum emitted is separate from the radiation spectrum emitted in the vicinity of a symmetrical point taken in relation to the axis of revolution (A).