Charged particle beam exposure method and charged particle beam exposure device
AssigneeFujitsu Microelectronics Limited
InventorYasushi Takahashi
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Abstract
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both sides of the space, and portions other than the edge portions of the large patterns on both sides are exposed by a variable rectangular beam or by using another block mask.
Claims8
A charged particle beam exposure method for exposing a pair of large patterns having a predetermined size or more, and a narrow space sandwiched by said pair of large patterns, comprising:
- exposing said narrow space area using a first block mask having said narrow space and edge areas of the large patterns on both sides thereof;
- and
- exposing an area other than said narrow space using either a second block mask different from said first block mask, or a mask for a variable rectangular beam.
A charged particle beam exposure device, wherein when a pair of large patterns having a predetermined size or more and a narrow space sandwiched by said pair of large patterns are exposed, said narrow space area is exposed using a first block mask having said narrow space and edge areas of large patterns on both sides thereof, and an area other than said narrow space is exposed by using either a second block mask that is different from said first block mask, or by a variable rectangular beam.
Dependencies are inferred from the claim text.