Forming method for film pattern, device, electro-optical apparatus, electronic apparatus, and manufacturing method for active matrix substrate

A forming method for a film pattern, comprising:

• forming a first bank layer by depositing a first bank formation material on a substrate;
• forming a second bank layer by depositing a second bank formation material over the first bank layer;
• patterning the first bank layer and the second bank layer thereby forming a bank having a pattern formation region including a first pattern formation region and a second pattern formation region which is connected to the first pattern formation region and has a width which is wider than that of the first pattern formation region;
• disposing a first functional liquid in the pattern formation region;
• drying the first functional liquid thereby forming a first dried layer;
• and
• disposing a second functional liquid over the first dried layer,
• wherein the first dried layer formed by drying the first functional layer is made thinner than the first bank layer, and
• wherein, the first bank formation material and the second bank formation material are both materials including a siloxane bonds as a main chain, and the second bank formation material is a material which includes a surfactant.

A forming method for a film pattern, comprising:

• forming a first bank layer by depositing a first bank formation material on a substrate;
• forming a second bank layer on the first bank layer;
• patterning the first bank layer and the second bank layer thereby forming a bank having a pattern formation region including a first pattern formation region and a second pattern formation region which is connected to the first pattern formation region and has a width which is wider than that of the first pattern formation region,
• wherein
• the first bank formation material is a material including a siloxane bonds as a main chain, and the second bank layer is made from a surface treatment material including fluorine,
• the forming method for a film pattern further comprising:
• disposing a first functional liquid onto the pattern formation region which has been demarcated by the bank:
• drying the first functional liquid thereby forming a first dried layer;
• and
• disposing a second functional liquid over the first dried layer, wherein
• the first dried layer formed by drying the first functional layer is made thinner than the first bank layer.