Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsGerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
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Abstract
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
Claims20
A coated substrate comprising:
- an antireflective composition layer comprising (i) component that comprises one or more optionally substituted aryl dicarboxylate groups and (ii) a solvent component comprising one or more oxyisobutyric acid esters;
- and
- a photoresist layer over the antireflective composition layer.
A method of forming a photoresist relief image, comprising:
- applying an antireflective composition layer on a substrate, the antireflective composition comprising (i) a component that comprises one or more optionally substituted aryl dicarboxylate groups and (ii) a solvent component comprising one or more oxyisobutyric acid esters;
- and
- applying a photoresist composition layer over the antireflective composition layer;
- and
- exposing and developing the photoresist layer to provide a resist relief image.
An antireflective coating composition comprising (i) a component that comprises one or more optionally substituted aryl dicarboxylate groups and (ii) a solvent component comprising one or more oxyisobutyric acid esters.
Dependencies are inferred from the claim text.