Piezoelectric film element, method of manufacturing the same, and liquid discharge head
AssigneeCanon Kabushiki Kaisha
InventorKoichiro Nakanishi
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Abstract
A porous layer composed of porous silicon, and the like is formed by anodization and the like on a substrate acting as a vibration sheet of, for example, a liquid discharging head, and a single crystal thin film is epitaxially grown on the porous layer. A lower electrode, a piezoelectric film, and an upper electrode are laminated on the single crystal thin film, and the piezoelectric film is made to a single crystal or a highly oriented polycrystal by a heat treatment. Stress caused by a difference between the thermal expansion coefficient of the substrate and that of the piezoelectric film can be eased by interposing the porous layer therebetween.
Claims6
A piezoelectric film element comprising:
- a substrate;
- a porous layer formed on the substrate, the porous layer consisting of one of silicon, gallium arsenide, alumina, and titanium oxide;
- a single crystal or single-oriented thin film formed on the porous layer;
- and
- a piezoelectric film formed above the thin film.
A liquid discharging head for pressurizing a liquid in pressure generating chambers by a piezoelectric drive force and discharging the liquid from discharging ports, the liquid discharging head comprising:
- a flow path substrate on which the pressure generating chambers are disposed;
- a vibration sheet disposed on the flow path substrate in correspondence to the pressure generating chambers;
- a porous layer formed on the vibration sheet, the porous layer consisting of one of silicon, gallium arsenide, alumina, and titanium oxide;
- a single crystal or single-oriented thin film formed on the porous layer;
- a piezoelectric film formed above the thin film;
- and
- electrodes for supplying power to the piezoelectric film.
Dependencies are inferred from the claim text.