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US 7,569,833 B2Granted
Apparatus for generating a plurality of beamlets
AssigneeMapper Lithography IP B.V.
InventorPieter Kruit
Life of this patent
Estimating the term…
Abstract
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Claims17
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source for generating a diverging charged particle beam,
- a lens array comprising a plurality of lenses,
- said lens array further comprising an aperture plate, wherein the aperture plate has an electrically conducting surface and means for defining the electrostatic potential of said surface, and
- means for defining an equipotentional surface at a distance from said aperture plate at a different potential than said aperture itself, wherein said means comprises a plate placed at a distance from said aperture plate, wherein said plate having a hole large enough to let the beam pass, and means for defining the electrostatic potential of said plate at a different potential than said aperture plate,
- wherein the apparatus comprises a converging means for refracting said diverging charged particle beam, and
- wherein the converging means is adapted for refracting a diverging charged particle beam into a substantially parallel charged particle beam for generating a plurality of substantially parallel charged particle beamlets,
- wherein said converging means comprises a collimator lens and further comprises an array of converging elements, wherein each element comprises a deflector aligned with a beamlet.
4 more elements
Dependencies are inferred from the claim text.