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US 7,569,490 B2Granted
Electrochemical etching
AssigneeWD Media, LLC
InventorNorbert Staud
Life of this patent
Estimating the term…
Abstract
Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
Claims32
A method, comprising:
- disposing a workpiece within an etchant solution having a composition comprising a dilute acid and an adsorbate, wherein the adsorbate comprises 2-benzimidazole proprionic acid;
- generating an electric field within the etchant solution;
- and
- anisotropically etching a pattern in a NiP surface of the workpiece.
1 more element
A method, comprising:
- disposing a workpiece within an etchant solution having a composition comprising a dilute acid and an adsorbate, wherein the workpiece comprises a disk substrate having a plated Nip layer over the disk substrate;
- generating an electric field within the etchant solution;
- and
- anisotropically etching a pattern in a surface of the workpiece.
1 more element
A method, comprising:
- disposing a workpiece within an etchant solution having a composition comprising a dilute acid and an adsorbate, wherein the adsorbate comprises 2-benzimidazole proprionic acid;
- generating an electric field within the etchant;
- and
- anisotropically etching a pattern in a surface of the workpiece, wherein the workpiece comprises a disk substrate, and wherein the method, before disposing the workpiece within the etchant, further comprises:
- plating a NiP layer over the disk substrate;
- depositing an embossable layer over the NiP layer;
- and
- imprinting the embossable layer with a stamper having a template of an etch pattern to be formed on the NiP layer.
5 more elements
Dependencies are inferred from the claim text.