Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors

A substrate processing system comprising:

• a body defining first and second processing regions that are separate and adjacent to one another;
• a first substrate support adapted to support a substrate within the first processing region and a second substrate support adapted to support a substrate within the second processing region;
• a first UV radiation lamp module spaced apart from the first substrate support and configured to transmit ultraviolet radiation to a first substrate positioned on the first substrate support;
• a second UV radiation lamp module spaced apart from the second substrate support and configured to transmit ultraviolet radiation to a second substrate positioned on the second substrate support;
• a first secondary reflector positioned between the first UV lamp module and the substrate support and adapted to redirect ultraviolet radiation that would otherwise not contact the first substrate towards the first substrate;
• and
• a second secondary reflector positioned between the second UV lamp module and the second substrate support and adapted to redirect ultraviolet radiation that would otherwise not contact the second substrate towards the second substrate, wherein the first UV radiation lamp module generates a substantially rectangular flood pattern of UV radiation and the first secondary reflector alters the flood pattern to a substantially circular flood pattern, and wherein the second UV radiation lamp module generates a substantially rectangular flood pattern of UV radiation and the second secondary reflector alters the flood pattern to a substantially circular flood pattern.

A substrate processing tool comprising:

• a body defining a substrate processing region;
• a substrate support adapted to support a substrate within the substrate processing region;
• an ultraviolet (UV) radiation lamp spaced apart from the substrate support and configured to generate a substantially rectangular flood pattern of UV radiation and transmit ultraviolet radiation to a substrate positioned on the substrate support, the UV radiation lamp comprising a source of UV radiation and a primary reflector partially surrounding the source of UV radiation, and
• a secondary reflector positioned between the primary reflector and the substrate support, the secondary reflector configured to reduce light loss outside the substrate and improve uniformity of irradiance across the surface of the substrate by reshaping a substantially rectangular flood pattern of light generated by the UV radiation lamp into a substantially circular flood pattern.