High-resolution auger electron spectrometer
AssigneeKLA-Tencor Technologies Corporation
InventorAlexander J. Gubbens
Life of this patent
Estimating the term…
Loading patent…
AssigneeKLA-Tencor Technologies Corporation
InventorAlexander J. Gubbens
Estimating the term…
One embodiment relates to a high-resolution Auger electron spectrometer in a scanning electron beam apparatus. An electron source generates a primary electron beam, and an immersion objective lens is configured to focus the primary electron beam onto a surface of a target substrate. A Wien filter is configured within the immersion objective lens and to deflect and disperse secondary electrons from the surface. A position sensitive detector is configured to receive the secondary electrons so as to detect an Auger electron spectrum. A first electron-optical lens may be positioned after the Wien filter so as to transfer a minimal-dispersion plane to an aperture plane. A second electron-optical lens may be positioned after the aperture so as to transfer a virtual focused-spectrum plane to a detector plane. Other embodiments, aspects and features are also disclosed.
A high-resolution Auger electron spectrometer in a scanning electron beam apparatus, the apparatus comprising:
A method of performing high-resolution Auger electron spectrometry, the method comprising:
Dependencies are inferred from the claim text.