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US 7,548,408 B2Granted
Capacitor and its manufacturing method
AssigneeSeiko Epson Corporation
InventorMasao Nakayama
Life of this patent
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Abstract
A method for manufacturing a capacitor includes the steps of: forming a conductive layer above a base substrate; forming a dielectric layer above the conductive layer; forming a lanthanum nickelate layer above the dielectric layer; and patterning at least the dielectric layer by using at least the lanthanum nickelate layer as a mask.
Claims7
A method for manufacturing a piezoelectric element, the method, comprising:
- forming a conductive layer that directly contacts a base substrate;
- forming a dielectric layer above the conductive layer;
- forming a second conductive layer above the dielectric layer;
- forming a first lanthanum nickelate layer above the dielectric layer;
- etching a part of the first lanthanum nickelate layer to form a mask;
- patterning the second conductive layer and the dielectric layer by using the mask;
- and
- removing the mask after the patterning of the second conductive layer and the dielectric layer.
5 more elements
Dependencies are inferred from the claim text.