Optical imaging device
AssigneeCarl Zeiss SMT GmbH
InventorsThorsten Rassel, Erich Merz, Martin Mahlmann
Life of this patent
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Abstract
An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).
Claims20
A projection objective for microlithography, having at least one optical element which is provided with an outer frame, an inner ring in which the optical element is mounted, and a manipulator instrument having at least one actuator, wherein contactless linkage of the inner ring to the outer frame is provided in at least one degree of freedom by means of a support arranged between the inner ring and the outer frame, the manipulator instrument having at least one actuator, the setting forces and/or bearing forces of which act contactlessly on the inner ring, for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame to reduce parasitic effects, said at least one degree of freedom including at least one degree of freedom other than rotation about an optical axis of the projection objective, the support comprising a fluid bearing, the fluid bearing comprising a gas bearing, the gas bearing having at least one gas feed line and at least one gas discharge line.
A projection objective for microlithography, comprising:
- (a) at least one optical element which is provided with an outer frame;
- (b) an inner ring in which the optical element is mounted;
- (c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and
- (d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, said support comprising a fluid bearing, said fluid bearing comprising a gas bearing having at least one gas feed line and at least one gas discharge line,
- the inner ring being provided with at least two annular recesses, which are fitted on a side of the inner ring next to the outer frame and which are connected to the at least one gas feed line and the at least one gas discharge line arranged in the outer frame.
A projection objective for microlithography, comprising:
- (a) at least one optical element which is provided with an outer frame;
- (b) an inner ring in which the optical element is mounted;
- (c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and
- (d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, and
- at least two sensors for determining the position of the inner ring in the radial direction relative to the outer frame.
A projection objective for microlithography, comprising:
- (a) at least one optical element which is provided with an outer frame;
- (b) an inner ring in which the optical element is mounted;
- (c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and
- (d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, the outer frame being provided with mechanical end stops for limiting the path of the inner ring.
A projection objective for microlithography, comprising:
- (a) at least one optical element which is provided with an outer frame;
- (b) an inner ring in which the optical element is mounted;
- (c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and
- (d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, the support comprising at least two support segments arranged on a circumferential region between the inner ring and the outer frame.
A projection objective for microlithography, comprising:
- (a) at least one optical element which is provided with an outer frame;
- (b) an inner ring in which the optical element is mounted;
- (c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and
- (d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, wherein the at least one actuator comprises three actuators which are mounted at a spacing of respectively 120° in the outer frame.
A projection objective for microlithography, having at least one optical element which is provided with an outer frame, an inner ring in which the optical element is mounted, and a manipulator instrument having at least one actuator, wherein contactless linkage of the inner ring to the outer frame is provided in at least one degree of freedom by means of a support arranged between the inner ring and the outer frame, the manipulator instrument having at least one actuator, the seffing forces and/or bearing forces of which act contactlessly on the inner ring, for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame to reduce parasitic effects, said at least one degree of freedom including at least one degree of freedom other than rotation about an optical axis of the projection objective, wherein a least two actuators are designed as air nozzles, the air exit openings of which are directed toward the inner ring.
Dependencies are inferred from the claim text.