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US 7,548,308 B2Granted
Illumination energy management in surface inspection
AssigneeKLA-Tencor Corporation
InventorsWayne Mcmillan, Christian Wolters
Life of this patent
Estimating the term…
Abstract
An apparatus and associated method for reducing thermal damage on a specimen during an inspection which includes a radiation source for supplying a beam of radiation, and a means for adjusting a first energy level of the beam of radiation to a second energy level as the beam of radiation is variably positioned from a first location on the surface of the wafer to a second location on the surface of the wafer.
Claims6
A method for managing radiation comprising:
- causing a surface of a wafer to be impinged by a beam of radiation at a first location with a first energy level;
- and
- adjusting said first energy level to a second energy level as said beam of radiation moves from said first location on said surface of said wafer to a second location on said surface of said wafer, wherein said adjusting said first energy level to said second energy level comprises varying the speed of rotation of the wafer as a function of the radial distance of the beam of radiation from the center of the wafer.
Dependencies are inferred from the claim text.