Semiconductor device, electronic device, and manufacturing method of the same
AssigneeRenesas Technology Corp.
InventorHisashi Toyoda
Life of this patent
Estimating the term…
Loading patent…
AssigneeRenesas Technology Corp.
InventorHisashi Toyoda
Estimating the term…
The present invention provides a technology that makes it possible to enhance the gain and the efficiency of an RF bipolar transistor. Device isolation is given between a p+ type isolation region and an n+ type collector embedded region and between a p+ type isolation region and an n type collector region (an n+ type collector extraction region) with an isolation section that surrounds the collector extraction region in a plan view and is formed by embedding a dielectric film in a groove penetrating an isolation section, a collector region, and a collector embedded region and reaching a substrate. Further, a current route is formed between an emitter wiring (a wiring) and the substrate with an electrically conductive layer formed by embedding the electrically conductive layer in a groove penetrating a dielectric film, silicon oxide films, a semiconductor region, and the isolation regions and reaching the substrate, and thereby the impedance between the emitter wiring and the substrate is reduced.
A semiconductor device including a bipolar transistor, the bipolar transistor comprising:
Dependencies are inferred from the claim text.