Techniques for providing a ribbon-shaped gas cluster ion beam
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAnthony Renau, Joseph C. Olson, Jonathan Gerald England
Life of this patent
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Abstract
Techniques for providing a ribbon-shaped gas cluster ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for providing a ribbon-shaped gas cluster ion beam. The apparatus may comprise at least one nozzle configured to inject a source gas at a sufficient speed into a low-pressure vacuum space to form gas clusters. The apparatus may also comprise at least one ionizer that causes at least a portion of the gas clusters to be ionized. The apparatus may further comprise a beam-shaping mechanism that forms a ribbon-shaped gas cluster ion beam based on the ionized gas clusters.
Claims19
An apparatus for providing a ribbon-shaped gas cluster ion beam, the apparatus comprising:
- an array of nozzles configured to inject a source gas at a sufficient speed into a low-pressure vacuum space to form gas clusters in a ribbon-shaped jet;
- at least one ionizer that causes at least a portion of the gas clusters to be ionized;
- and
- a beam-shaping mechanism that forms a ribbon-shaped gas cluster ion beam based on the ionized gas clusters.
A method for providing a ribbon-shaped gas cluster ion beam, the method comprising the steps of:
- injecting, through an array of nozzles, a source gas at a sufficient speed into a low-pressure vacuum space to form gas clusters in a ribbon-shaped jet;
- causing at least a portion of the gas clusters to be ionized;
- and
- forming a ribbon-shaped gas cluster ion beam based on the ionized gas clusters.
Dependencies are inferred from the claim text.