Charged beam dump and particle attractor
AssigneeAxcelis Technologies, Inc.
InventorsJohn W. Vanderpot, Yongzhang Huang
Life of this patent
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Abstract
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.
Claims28
A device for reducing contamination in an ion implantation system, comprising:
- a particle collector having a collection region defined therein;
- a particle attractor generally positioned within the collection region of the particle collector;
- and
- a shield operable to constrain an electrical potential associated with the particle attractor to within the collector region of the particle collector.
An ion implantation system, comprising:
- an ion source;
- an end station;
- and
- a mass analyzer positioned between the ion source and the end station, wherein the mass analyzer comprises an ion beam dump assembly, wherein the ion beam dump assembly comprises a particle collector, a particle attractor disposed within the particle collector, and a shield operable to constrain an electrical potential of the particle attractor to within the particle collector.
A method for controlling contamination in an ion implantation system, the method comprising:
- mass analyzing an ion beam, wherein a desired ion beam and one or more waste ion beams are defined;
- applying an electrical potential within a particle collector positioned along a path of one or more of the waste ion beams;
- electrically shielding the particle collector, wherein the electrical potential within the particle collector does not significantly affect a path of the desired ion beam;
- and
- entraining contamination particles associated with the one or more waste ion beams via the electrical potential within a particle collector after the one or more waste ion beams enter the particle collector.
Dependencies are inferred from the claim text.