Pattern defect inspection method and apparatus thereof

A defect inspection method comprising:

• obtaining an image of a circuit pattern formed on a specimen by areally irradiating said specimen with a first electron beam, reflecting said first electron beam immediately before entering said specimen, and focusing the reflected electrons into an image;
• and
• inspecting and detecting a defect existing in said circuit pattern on the basis of the circuit pattern image,
• wherein the electrification potential distribution of said specimen generated by irradiating the surface of said specimen with ultraviolet rays or a second electron beam before obtaining said circuit pattern image is uniform.

An inspection apparatus comprising:

• an electron optical system to irradiate a first region of a specimen with an electron beam;
• a specimen stage to retain said specimen;
• a means of applying such a voltage that said electron beam with which said specimen is irradiated does not enter said specimen but is reflected to said specimen stage or said specimen;
• a means of detecting the electrons reflected from the side of said specimen by the application of said voltage;
• a means of forming an inspection image and detecting a defect of said specimen on the basis of the detection signals of said detecting means;
• and
• a means of irradiating said first region with ultraviolet rays or a second electron beam before said inspection image is formed.