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US 7,547,672 B2Granted
Composition for cleaning and degreasing, system for using the composition, and methods of forming and using the composition
AssigneePantheon Chemical, Inc.
InventorNael N. Zaki
Life of this patent
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Abstract
A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.
Claims12
A composition for cleaning and recycling comprising:
- about 0 to about 50 weight percent diluent;
- about 1 to 50 weight percent surfactant;
- about 0.5 to about 20 weight percent co-solvent, wherein the co-solvent is selected from a group consisting of propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, dipropylene glycol n-propyl ether, tripropylene glycol n-propvl ether, dipropylene glycol n-butyl ether, propylene glycol n-butyl ether, tripropylene glycol n-butyl ether, dipropylene glycol dimethyl ether, fatty acid methyl esters, and fatty acid amides;
- and
- about 10 to about 99.5 weight percent 2-ethylhexyl ester, wherein the 2-ethylhexyl ester is selected from the group consisting of 2-ethylhexylcinnamate, of 2-ethylhexylsalicylate, 2-ethyihexyladipate, 2-ethylhexylstearate, and 2-ethyihexylsuccinate.
2 more elements
Dependencies are inferred from the claim text.