Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same

A method for producing a film pattern comprising:

• (a) patterning a resin film on a substrate surface;
• (b) impregnating the patterned resin film with a constituent of a conductive film or a semiconductor film;
• (c) after the patterning step (a) and the impregnating step (b), irradiating the entire resin film which contains the constituent of the conductive film or the semiconductor film with ultraviolet radiation;
• and
• (d) after the irradiating step (c), heating the resin film which contains the constituent of the conductive film or the semiconductor film at a temperature not lower than a decomposition temperature of the resin to modify the resin film into the conductive film or the semiconductor film.