Method of protecting semiconductor chips from mechanical and ESD damage during handling
AssigneeEmcore Corporation
InventorsRichard Carson, Elaine Taylor, Douglas Collins
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AssigneeEmcore Corporation
InventorsRichard Carson, Elaine Taylor, Douglas Collins
Estimating the term…
A method and apparatus are provided for protecting a semiconductor device from damage. The method includes the steps of providing a active semiconductor device on a surface of the semiconductor substrate where the active device is surrounded by inactive semiconductor areas and providing a soft metallic guard ring only in the inactive semiconductor areas around the periphery of the active device wherein the metallic guard ring is connected to ground potential and not to the active device.
A method of protecting a semiconductor device from damage comprising:
Apparatus for protecting a semiconductor device from damage comprising:
Dependencies are inferred from the claim text.
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Semiconductor lasers: structure or shape of the active region; Materials used for the active region
Integrated devices formed in or on semiconductor substrates that comprise only semiconducting
Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]:…
Arrangements for protection of devices
About 5 months of term left · ends 27 Mar 2027 (estimated)
The field of the invention relates to semiconductors and more particularly to methods of semiconductor design and processing.
Methods of manufacturing vertical cavity surface emitting laser (VCSEL) chips are generally known. However, one of the impediments to the successful manufacturing of such devices is the susceptibility of such devices to damage. In addition to physical damage, VCSELs and photodioes may be subject to electrostat discharge (ESD) or electrical over-stress (EOD) damage.
Two market trends are driving VCSEL and photodiode chip design towards a regime where die damage during handling is more and more likely. The first trend has to do with smaller active regions. Smaller active regions (volumes) are needed for higher speeds (e.g., 4 Gb/s, 10 Gb/s applications), modal control (e.g., sensing applications, optical mice, etc.) or both. ESD/EOS damage thresholds fall as one over the square of the optical aperture size of such devices.
FIG. 1 is a top plan view of a wafer under an illustrated embodiment of the invention;
FIG. 2 is a side cut-away view of the wafer of FIG. 1;
FIG. 3 is a top view of a chip of the wafer of FIG. 1;
FIG. 1 depicts a wafer 10 of semiconductor devices 12, 14, 16, 18 fabricated in accordance with an illustrated embodiment of the invention. FIG. 3 is an exemplary semiconductor chip 20 formed by separating the wafer 10 and where each chip 20 contains one of the semiconductor devices 12, 14, 16, 18. FIGS. 4 and 5 show alternative cut-away side views of the chip 20. The semiconductor devices 12, 14, 16, 18 may be VCSEL lasers or photodiodes and may be either arrays or single devices.
In addition to the semiconductor device 12, 14, 16, 18, each chip 20 is provided with a guard ring 22 (FIG. 3) for mechanically protecting the optical aperture of the semiconductor device 12, 14, 16, 18 from mechanical damage as well as to provide a harmless discharge path for any charge that may build up on pickup tools. If severe mechanical damage does occur, the guard ring is designed to provide a clear visual indicator of damage thereby increasing the likelihood that the chip 20 will be discarded before being used.
Turning now to the drawings, the wafer 10 may be divided into a grid of chip areas 13, 15, 17, 19 (where each chip area may be as depicted as shown in FIG. 3). The active areas 26 of the wafer 10 are separated from other active areas 26 (and surrounded) by inactive areas 28 (where the inactive areas 28 do not include any other active devices).