Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device

A photosensitive silane coupling agent having a structure represented by the following general formula (1),

• wherein X is a polymethylene group part of hydrogen atoms of which may be substituted with a fluorine atom or an alkyl group, a phenylene group part of hydrogen atoms of which may be substituted with a fluorine atom or an alkyl group, a naphthylene group part of hydrogen atoms of which may be substituted with a fluorine atom or an alkyl group, or a divalent group having a structure on which at least two of the polymethylene group, the phenylene group, and the naphthylene group are bonded to each other;
• at least one of R1, R2 and R3 is an alkoxy group or a halogen atom, the other(s) being selected from the group consisting of an alkyl group, an alkenyl group and a hydrogen atom;
• R4 is an alkyl group part of hydrogen atoms of which may be substituted with a fluorine atom, a phenyl group part of hydrogen atoms of which may be substituted with a fluorine atom or an alkyl group, or a naphthyl group part of hydrogen atoms of which may be substituted with a fluorine atom or an alkyl group;
• R5 is a hydrogen atom or an alkyl group;
• and R6, R7, R8 and R9 are selected from the group consisting of a nitro group, a hydrogen atom, a halogen atom, an alkyl group, and an alkyl group or an alkoxy group part or the whole of hydrogen atoms of which are substituted with a fluorine atom.