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US 7,547,501 B2Granted
Photoactive compounds
AssigneeAZ Electronic Materials USA Corp.
InventorsRalph R. Dammel, M. Dalil Rahman, David L. Rentkiewicz, Karl van Werden
Life of this patent
Estimating the term…
Abstract
The present application relates to photoactive materials having the formula wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R36, R37, R38, R39, R40, and R41 are selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or more O atoms, aryl, aralkyl, alkoxyalkyl, cycloalkyl, and alkoxy groups being unsubstituted or substituted.
Claims5
A photoresist composition useful for imaging in deep UV comprising;
- a) a polymer containing an acid labile group;
- b) a compound selected from triphenylsulfonium 1-carba-closo-dodecarborane, bis(4-t-butylphenyl) iodonium 1-carba-closo-dodecarborane, bis(4-t-butylphenyl) iodonium 1-carba-2,3,5,7,9,10-hexachloro-closo-dodecarborane, bis(4-t-butylphenyl) iodonium 1-carba-2,3,5,7,9,10-hexabromo-closo-dodecarborane, (4-t-butylphenyl) iodonium 1-carba-1,2,3,4,5,6,7,8,9,10,11,12-dodecamethyl-closo-dodecarborane, bis(4-t-butylphenyl)iodonium 1-carba-1,2,3,4,5,6,7,8,9,10,11,12-dodecatrifluoromethyl-closo-dodecarborane;
- and c) two or more additional photoacid generators selected from bis(triphenyl sulfonium)perfluorobutane-1,4-disulfonate, bis(4-t-butylphenyl)iodonium perfluorobutane-1,4-disulfonate, bis(4-t-butylphenyl)iodonium bis-perfluoroethane sulfonimide, and mixtures thereof.
Dependencies are inferred from the claim text.