Fullerene derivatives and processes for producing the same
AssigneesEiichi Nakamura, Mitsubishi Chemical Corporation
InventorsEiichi Nakamura, Yutaka Matsuo
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Abstract
The present invention relates to a fullerene derivative having a partial structure represented by the general formula (I): wherein C1 to C8 are carbon atoms constituting a fullerene skeleton in which C6 to C8 are independently bonded to an organic group having 1 to 50 carbon atoms, and C1 is bonded to a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
Claims15
A fullerene derivative having a partial structure represented by the general formula (I):
- wherein C1 to C8 are carbon atoms constituting a fullerene skeleton in which C6 to C8 are independently bonded to a group R1 having 1 to 50 carbon atoms, and C1 is bonded to a group R2 which is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms wherein R1 and R2 are different from each other.
A fullerene derivative having a partial structure represented by the general formula (II):
- wherein C1 to C10 all are carbon atoms constituting a fullerene skeleton in which C6 to C10 are independently bonded to a group R1 having 1 to 50 carbon atoms, and C1 is bonded to a group R2 which is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms wherein R1 and R2 are different from each other.
A process for producing the fullerene derivative as defined in claim comprising:
- reacting a fullerene derivative having halogen atoms on a cyclopentadiene ring of a fullerene skeleton thereof with an arylalkane compound in the presence of a transition metal complex wherein the valence number of transition metal is 2 or less.
Dependencies are inferred from the claim text.