Vaporizing apparatus and semiconductor processing system

A semiconductor processing system comprising:

• a process chamber configured to accommodate a target substrate;
• a support member configured to support the target substrate inside the process chamber;
• a heater configured to heat the target substrate inside the process chamber;
• an exhaust system configured to exhaust gas from inside the process chamber;
• and
• a gas supply section configured to supply a process gas into the process chamber, and including a vaporizing apparatus for generating the process gas from a liquid material,
• wherein the vaporizing apparatus comprises
• a vaporizing container defining a vaporizing space of the vaporizing apparatus,
• an injector connected to the vaporizing container to spray the liquid material in an atomized state into the vaporizing space,
• a heater attached to the vaporizing container to heat the liquid material sprayed in the vaporizing space,
• a gas delivery passage connected to the vaporizing container to output from the vaporizing space a generation gas generated from the liquid material,
• a filter disposed inside the gas delivery passage or between the gas delivery passage and the vaporizing space to trap mist contained in the generation gas, and
• an infrared irradiation mechanism configured to irradiate the filter with infrared rays.